| Reference Type | Journal (article/letter/editorial) |
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| Title | Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses |
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| Journal | Applied Physics Letters |
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| Authors | Hartmann, N. | Author |
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| Franzka, S. | Author |
| Koch, J. | Author |
| Ostendorf, A. | Author |
| Chichkov, B. N. | Author |
| Year | 2008 (June 2) | Volume | 92 |
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| Issue | 22 |
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| Publisher | AIP Publishing |
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| DOI | doi:10.1063/1.2939585Search in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 8564378 | Long-form Identifier | mindat:1:5:8564378:1 |
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|
| GUID | 0 |
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| Full Reference | Hartmann, N., Franzka, S., Koch, J., Ostendorf, A., Chichkov, B. N. (2008) Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses. Applied Physics Letters, 92 (22). 223111pp. doi:10.1063/1.2939585 |
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| Plain Text | Hartmann, N., Franzka, S., Koch, J., Ostendorf, A., Chichkov, B. N. (2008) Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses. Applied Physics Letters, 92 (22). 223111pp. doi:10.1063/1.2939585 |
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| In | (2008, June) Applied Physics Letters Vol. 92 (22) AIP Publishing |
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