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Hartmann, N., Franzka, S., Koch, J., Ostendorf, A., Chichkov, B. N. (2008) Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses. Applied Physics Letters, 92 (22). 223111pp. doi:10.1063/1.2939585

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Reference TypeJournal (article/letter/editorial)
TitleSubwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses
JournalApplied Physics Letters
AuthorsHartmann, N.Author
Franzka, S.Author
Koch, J.Author
Ostendorf, A.Author
Chichkov, B. N.Author
Year2008 (June 2)Volume92
Issue22
PublisherAIP Publishing
DOIdoi:10.1063/1.2939585Search in ResearchGate
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Mindat Ref. ID8564378Long-form Identifiermindat:1:5:8564378:1
GUID0
Full ReferenceHartmann, N., Franzka, S., Koch, J., Ostendorf, A., Chichkov, B. N. (2008) Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses. Applied Physics Letters, 92 (22). 223111pp. doi:10.1063/1.2939585
Plain TextHartmann, N., Franzka, S., Koch, J., Ostendorf, A., Chichkov, B. N. (2008) Subwavelength patterning of alkylsiloxane monolayers via nonlinear processing with single femtosecond laser pulses. Applied Physics Letters, 92 (22). 223111pp. doi:10.1063/1.2939585
In(2008, June) Applied Physics Letters Vol. 92 (22) AIP Publishing


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