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Huang, J.-H, Lin, C.-H, Chen, Haydn (1999) Ion beam assisted deposition of TiN thin film on Si (100). Materials Chemistry and Physics, 59. 49-56 doi:10.1016/s0254-0584(99)00023-1

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Reference TypeJournal (article/letter/editorial)
TitleIon beam assisted deposition of TiN thin film on Si (100)
JournalMaterials Chemistry and Physics
AuthorsHuang, J.-HAuthor
Lin, C.-HAuthor
Chen, HaydnAuthor
Year1999 (April)Volume59
PublisherElsevier BV
DOIdoi:10.1016/s0254-0584(99)00023-1Search in ResearchGate
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Mindat Ref. ID3051624Long-form Identifiermindat:1:5:3051624:7
GUID0
Full ReferenceHuang, J.-H, Lin, C.-H, Chen, Haydn (1999) Ion beam assisted deposition of TiN thin film on Si (100). Materials Chemistry and Physics, 59. 49-56 doi:10.1016/s0254-0584(99)00023-1
Plain TextHuang, J.-H, Lin, C.-H, Chen, Haydn (1999) Ion beam assisted deposition of TiN thin film on Si (100). Materials Chemistry and Physics, 59. 49-56 doi:10.1016/s0254-0584(99)00023-1
In(1999, April) Materials Chemistry and Physics Vol. 59 (1) Elsevier BV

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