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Huang, B.R, Wu, C.H, Ke, W.Z (1999) Surface analysis of boron-doped polycrystalline diamond films deposited by a microwave plasma chemical vapor deposition system. Materials Chemistry and Physics, 59. 143-148 doi:10.1016/s0254-0584(99)00036-x

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Reference TypeJournal (article/letter/editorial)
TitleSurface analysis of boron-doped polycrystalline diamond films deposited by a microwave plasma chemical vapor deposition system
JournalMaterials Chemistry and Physics
AuthorsHuang, B.RAuthor
Wu, C.HAuthor
Ke, W.ZAuthor
Year1999 (May)Volume59
PublisherElsevier BV
DOIdoi:10.1016/s0254-0584(99)00036-xSearch in ResearchGate
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Mindat Ref. ID3051644Long-form Identifiermindat:1:5:3051644:1
GUID0
Full ReferenceHuang, B.R, Wu, C.H, Ke, W.Z (1999) Surface analysis of boron-doped polycrystalline diamond films deposited by a microwave plasma chemical vapor deposition system. Materials Chemistry and Physics, 59. 143-148 doi:10.1016/s0254-0584(99)00036-x
Plain TextHuang, B.R, Wu, C.H, Ke, W.Z (1999) Surface analysis of boron-doped polycrystalline diamond films deposited by a microwave plasma chemical vapor deposition system. Materials Chemistry and Physics, 59. 143-148 doi:10.1016/s0254-0584(99)00036-x
In(1999, May) Materials Chemistry and Physics Vol. 59 (2) Elsevier BV

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Huang, B.R, Ke, W.Z (1999) The physical characterization of the (111) and (100) textured diamond films synthesized by two optimal conditions. Materials Chemistry and Physics, 60. 143-149 doi:10.1016/s0254-0584(99)00079-6
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Nishimura, K., Das, K., Glass, J. T. (1991) Material and electrical characterization of polycrystalline boronā€doped diamond films grown by microwave plasma chemical vapor deposition. Journal of Applied Physics, 69 (5). 3142-3148 doi:10.1063/1.348582
Mane, R.S., Sankapal, B.R., Lokhande, C.D. (1999) Photoelectrochemical cells based on chemically deposited nanocrystalline Bi2S3 thin films. Materials Chemistry and Physics, 60. 196-203 doi:10.1016/s0254-0584(99)00085-1
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Wang, S.B, Zhu, P.R, Feng, K (2000) Passivation of boron in the doped CVD diamond films by H+ implantation. Materials Chemistry and Physics, 64. 10-13 doi:10.1016/s0254-0584(99)00235-7
Chen, Mao Rong, Chang, Li, Chang, Der Fu, Chen, Hou Guang (2001) Diamond growth on CoSi2/Si by bias-enhanced microwave plasma chemical vapor deposition method. Materials Chemistry and Physics, 72. 172-175 doi:10.1016/s0254-0584(01)00430-8
 
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