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Liang, Xinhua, King, David M., Li, Peng, Weimer, Alan W. (2009) Low-Temperature Atomic Layer-Deposited TiO2Films with Low Photoactivity. Journal of the American Ceramic Society, 92 (3). 649-654 doi:10.1111/j.1551-2916.2009.02940.x

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Reference TypeJournal (article/letter/editorial)
TitleLow-Temperature Atomic Layer-Deposited TiO2Films with Low Photoactivity
JournalJournal of the American Ceramic Society
AuthorsLiang, XinhuaAuthor
King, David M.Author
Li, PengAuthor
Weimer, Alan W.Author
Year2009 (March)Volume92
Issue3
PublisherWiley
DOIdoi:10.1111/j.1551-2916.2009.02940.xSearch in ResearchGate
Generate Citation Formats
Mindat Ref. ID4100472Long-form Identifiermindat:1:5:4100472:0
GUID0
Full ReferenceLiang, Xinhua, King, David M., Li, Peng, Weimer, Alan W. (2009) Low-Temperature Atomic Layer-Deposited TiO2Films with Low Photoactivity. Journal of the American Ceramic Society, 92 (3). 649-654 doi:10.1111/j.1551-2916.2009.02940.x
Plain TextLiang, Xinhua, King, David M., Li, Peng, Weimer, Alan W. (2009) Low-Temperature Atomic Layer-Deposited TiO2Films with Low Photoactivity. Journal of the American Ceramic Society, 92 (3). 649-654 doi:10.1111/j.1551-2916.2009.02940.x
In(2009, March) Journal of the American Ceramic Society Vol. 92 (3) Wiley

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