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Fleischmann, Claudia, Cuduvally, Ramya, Morris, Richard, Melkonyan, Davit, de Beeck, Jonathan Op, Makhotkin, Igor, van der Heide, Paul, Vandervorst, Wilfried (2019) Opportunities and Challenges in APT Metrology for Semiconductor Applications. Microscopy and Microanalysis, 25. 312-313 doi:10.1017/s1431927619002290

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Reference TypeJournal (article/letter/editorial)
TitleOpportunities and Challenges in APT Metrology for Semiconductor Applications
JournalMicroscopy and Microanalysis
AuthorsFleischmann, ClaudiaAuthor
Cuduvally, RamyaAuthor
Morris, RichardAuthor
Melkonyan, DavitAuthor
de Beeck, Jonathan OpAuthor
Makhotkin, IgorAuthor
van der Heide, PaulAuthor
Vandervorst, WilfriedAuthor
Year2019 (August)Volume25
PublisherCambridge University Press (CUP)
DOIdoi:10.1017/s1431927619002290Search in ResearchGate
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Mindat Ref. ID4885960Long-form Identifiermindat:1:5:4885960:6
GUID0
Full ReferenceFleischmann, Claudia, Cuduvally, Ramya, Morris, Richard, Melkonyan, Davit, de Beeck, Jonathan Op, Makhotkin, Igor, van der Heide, Paul, Vandervorst, Wilfried (2019) Opportunities and Challenges in APT Metrology for Semiconductor Applications. Microscopy and Microanalysis, 25. 312-313 doi:10.1017/s1431927619002290
Plain TextFleischmann, Claudia, Cuduvally, Ramya, Morris, Richard, Melkonyan, Davit, de Beeck, Jonathan Op, Makhotkin, Igor, van der Heide, Paul, Vandervorst, Wilfried (2019) Opportunities and Challenges in APT Metrology for Semiconductor Applications. Microscopy and Microanalysis, 25. 312-313 doi:10.1017/s1431927619002290
In(2019) Microscopy and Microanalysis Vol. 25. Cambridge University Press (CUP)


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