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Wang, Hanfu, Chu, Weiguo, Jin, Hao, Xiong, Yufeng (2008) Atomistic simulation of Si–Ge clathrate alloys. Chemical Physics, 344. 299-308 doi:10.1016/j.chemphys.2008.01.032

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Reference TypeJournal (article/letter/editorial)
TitleAtomistic simulation of Si–Ge clathrate alloys
JournalChemical Physics
AuthorsWang, HanfuAuthor
Chu, WeiguoAuthor
Jin, HaoAuthor
Xiong, YufengAuthor
Year2008 (March)Volume344
PublisherElsevier BV
DOIdoi:10.1016/j.chemphys.2008.01.032Search in ResearchGate
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Mindat Ref. ID5961452Long-form Identifiermindat:1:5:5961452:2
GUID0
Full ReferenceWang, Hanfu, Chu, Weiguo, Jin, Hao, Xiong, Yufeng (2008) Atomistic simulation of Si–Ge clathrate alloys. Chemical Physics, 344. 299-308 doi:10.1016/j.chemphys.2008.01.032
Plain TextWang, Hanfu, Chu, Weiguo, Jin, Hao, Xiong, Yufeng (2008) Atomistic simulation of Si–Ge clathrate alloys. Chemical Physics, 344. 299-308 doi:10.1016/j.chemphys.2008.01.032
In(n.d.) Chemical Physics Vol. 344. Elsevier BV

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