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Chen, Chi-Lin, Lue, Juh-Tzeng (1996) Photoluminescence and Raman studies of hydrogenated amorphous carbon films deposited by the rf plasma-enhanced CVD method. Journal of Non-Crystalline Solids, 194 (1) 93-102 doi:10.1016/0022-3093(95)00469-6

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Reference TypeJournal (article/letter/editorial)
TitlePhotoluminescence and Raman studies of hydrogenated amorphous carbon films deposited by the rf plasma-enhanced CVD method
JournalJournal of Non-Crystalline Solids
AuthorsChen, Chi-LinAuthor
Lue, Juh-TzengAuthor
Year1996 (January)Volume194
Issue1
PublisherElsevier BV
DOIdoi:10.1016/0022-3093(95)00469-6Search in ResearchGate
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Mindat Ref. ID635151Long-form Identifiermindat:1:5:635151:3
GUID0
Full ReferenceChen, Chi-Lin, Lue, Juh-Tzeng (1996) Photoluminescence and Raman studies of hydrogenated amorphous carbon films deposited by the rf plasma-enhanced CVD method. Journal of Non-Crystalline Solids, 194 (1) 93-102 doi:10.1016/0022-3093(95)00469-6
Plain TextChen, Chi-Lin, Lue, Juh-Tzeng (1996) Photoluminescence and Raman studies of hydrogenated amorphous carbon films deposited by the rf plasma-enhanced CVD method. Journal of Non-Crystalline Solids, 194 (1) 93-102 doi:10.1016/0022-3093(95)00469-6
In(1996, January) Journal of Non-Crystalline Solids Vol. 194 (1) Elsevier BV

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Chen, Sheng-Yuan, Lue, Juh-Tzeng (2001) The characterization of amorphous carbon nitride films grown by RFCVD method. Journal of Non-Crystalline Solids, 283 (1) 95-100 doi:10.1016/s0022-3093(01)00354-4
Lue, Juh-Tzeng, Chen, Sheng-Yuan, Chen, Chi-Ling, Lin, Mei-Chung (2000) Field emission studies of diamond-like films grown by RFCVD. Journal of Non-Crystalline Solids, 265 (3) 230-237 doi:10.1016/s0022-3093(00)00006-5
Shimizu, Hideki, Nakao, Setsuo, Kusakabe, Hiroshi, Noda, Mikio (1989) Microstructures of hydrogenated amorphous carbon films prepared by rf plasma CVD. Journal of Non-Crystalline Solids, 114. 196-198 doi:10.1016/0022-3093(89)90111-7
Lue, Juh Tzeng, Shaw, Sen-yen (1986) Laminant distribution of hydrogenated bonds in amorphoussilicon deposited by RF sputtering. physica status solidi (a), 95 (1). doi:10.1002/pssa.2210950162
Sun, Z (2000) Morphological features of diamond-like carbon films deposited by plasma-enhanced CVD. Journal of Non-Crystalline Solids, 261 (1) 211-217 doi:10.1016/s0022-3093(99)00593-1
Fabisiak, K., Orzeszko, S., Rozpo̵ch, F., Szatkowski, J. (1988) RF Plasma deposited amorphous carbon films Electronic and optical properties. Journal of Non-Crystalline Solids, 99 (1) 12-22 doi:10.1016/0022-3093(88)90453-x
Robertson, J. (1996) Electronic processes in hydrogenated amorphous carbon. Journal of Non-Crystalline Solids, 198. 615-618 doi:10.1016/0022-3093(95)00775-x
Chen, Yu-Hung, Fang, Hsuan-Yin, Yeh, Chun-Ming (2011) Raman scattering and electrical characterizations studies of hydrogenated amorphous silicon–germanium alloys prepared by 40MHz plasma-enhanced CVD. Journal of Non-Crystalline Solids, 357 (1) 1-3 doi:10.1016/j.jnoncrysol.2010.09.060
Al-Dallal, S., Al-Alawi, S.M., Aljishi, S., Hamman, M., Arekat, S. (1996) Hydrogenated amorphous carbon-sulfur alloy thin films grown from a CH4 and H2S gas mixture by rf glow discharge. Journal of Non-Crystalline Solids, 196. 168-172 doi:10.1016/0022-3093(95)00580-3
Wang, J.J., Zhang, D.H., Liu, L.J., Chen, X.K. (1996) Electronic transport properties of a-Siî—¸Yî—¸H alloy films deposited by rf sputtering. Journal of Non-Crystalline Solids, 197 (1) 25-30 doi:10.1016/0022-3093(95)00521-8
Morell, G., Katiyar, R.S., Weisz, S.Z., Balberg, I. (1996) Characterization of the silicon network disorder in hydrogenated amorphous silicon carbide alloys with low carbon concentrations. Journal of Non-Crystalline Solids, 194 (1) 78-84 doi:10.1016/0022-3093(95)00459-9
 
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