| Reference Type | Journal (article/letter/editorial) |
|---|
| Title | New precursors for organometallic chemical vapor deposition of rhodium |
|---|
| Journal | Canadian Journal of Chemistry |
|---|
| Authors | Kumar, R. | Author |
|---|
| Puddephatt, R. J. | Author |
| Year | 1991 (January 1) | Volume | 69 |
|---|
| Issue | 1 |
|---|
| Publisher | Canadian Science Publishing |
|---|
| DOI | doi:10.1139/v91-017Search in ResearchGate |
|---|
| Generate Citation Formats |
| Mindat Ref. ID | 8317536 | Long-form Identifier | mindat:1:5:8317536:5 |
|---|
|
| GUID | 0 |
|---|
| Full Reference | Kumar, R., Puddephatt, R. J. (1991) New precursors for organometallic chemical vapor deposition of rhodium. Canadian Journal of Chemistry, 69 (1). 108-110 doi:10.1139/v91-017 |
|---|
| Plain Text | Kumar, R., Puddephatt, R. J. (1991) New precursors for organometallic chemical vapor deposition of rhodium. Canadian Journal of Chemistry, 69 (1). 108-110 doi:10.1139/v91-017 |
|---|
| In | (1991, January) Canadian Journal of Chemistry Vol. 69 (1) Canadian Science Publishing |
|---|
These are possibly similar items as determined by title/reference text matching only.