Cho, Won-Ju, Ahn, Chang-Geun (2007) Thermal annealing effects on the electrical characteristics of the back interface in nano-silicon-on-insulator channel. Applied Physics Letters, 90 (14). 143509pp. doi:10.1063/1.2719641
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Thermal annealing effects on the electrical characteristics of the back interface in nano-silicon-on-insulator channel | ||
| Journal | Applied Physics Letters | ||
| Authors | Cho, Won-Ju | Author | |
| Ahn, Chang-Geun | Author | ||
| Year | 2007 (April 2) | Volume | 90 |
| Issue | 14 | ||
| Publisher | AIP Publishing | ||
| DOI | doi:10.1063/1.2719641Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 8553263 | Long-form Identifier | mindat:1:5:8553263:4 |
| GUID | 0 | ||
| Full Reference | Cho, Won-Ju, Ahn, Chang-Geun (2007) Thermal annealing effects on the electrical characteristics of the back interface in nano-silicon-on-insulator channel. Applied Physics Letters, 90 (14). 143509pp. doi:10.1063/1.2719641 | ||
| Plain Text | Cho, Won-Ju, Ahn, Chang-Geun (2007) Thermal annealing effects on the electrical characteristics of the back interface in nano-silicon-on-insulator channel. Applied Physics Letters, 90 (14). 143509pp. doi:10.1063/1.2719641 | ||
| In | (2007, April) Applied Physics Letters Vol. 90 (14) AIP Publishing | ||
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