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Jo, Gunho, Maeng, Jongsun, Kim, Tae-Wook, Hong, Woong-Ki, Jo, Minseok, Hwang, Hyunsang, Lee, Takhee (2007) Effects of channel-length scaling on In2O3 nanowire field effect transistors studied by conducting atomic force microscopy. Applied Physics Letters, 90 (17). 173106pp. doi:10.1063/1.2728754

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Reference TypeJournal (article/letter/editorial)
TitleEffects of channel-length scaling on In2O3 nanowire field effect transistors studied by conducting atomic force microscopy
JournalApplied Physics Letters
AuthorsJo, GunhoAuthor
Maeng, JongsunAuthor
Kim, Tae-WookAuthor
Hong, Woong-KiAuthor
Jo, MinseokAuthor
Hwang, HyunsangAuthor
Lee, TakheeAuthor
Year2007 (April 23)Volume90
Issue17
PublisherAIP Publishing
DOIdoi:10.1063/1.2728754Search in ResearchGate
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Mindat Ref. ID8553602Long-form Identifiermindat:1:5:8553602:9
GUID0
Full ReferenceJo, Gunho, Maeng, Jongsun, Kim, Tae-Wook, Hong, Woong-Ki, Jo, Minseok, Hwang, Hyunsang, Lee, Takhee (2007) Effects of channel-length scaling on In2O3 nanowire field effect transistors studied by conducting atomic force microscopy. Applied Physics Letters, 90 (17). 173106pp. doi:10.1063/1.2728754
Plain TextJo, Gunho, Maeng, Jongsun, Kim, Tae-Wook, Hong, Woong-Ki, Jo, Minseok, Hwang, Hyunsang, Lee, Takhee (2007) Effects of channel-length scaling on In2O3 nanowire field effect transistors studied by conducting atomic force microscopy. Applied Physics Letters, 90 (17). 173106pp. doi:10.1063/1.2728754
In(2007, April) Applied Physics Letters Vol. 90 (17) AIP Publishing


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