Puyenbroek, Robert, Bosscher, Gerard, Van De Grampel, Johan C., Rousseeuw, Bernard A. C., Van Der Drift, Emile W. J. M. (1994) The Application of Phosphazene Containing Polymers as Negative Resists in Microlithography. Phosphorus, Sulfur, and Silicon and the Related Elements, 93. 277-280 doi:10.1080/10426509408021834
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | The Application of Phosphazene Containing Polymers as Negative Resists in Microlithography | ||
| Journal | Phosphorus, Sulfur, and Silicon and the Related Elements | ||
| Authors | Puyenbroek, Robert | Author | |
| Bosscher, Gerard | Author | ||
| Van De Grampel, Johan C. | Author | ||
| Rousseeuw, Bernard A. C. | Author | ||
| Van Der Drift, Emile W. J. M. | Author | ||
| Year | 1994 (August) | Volume | 93 |
| Publisher | Informa UK Limited | ||
| DOI | doi:10.1080/10426509408021834Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 9763516 | Long-form Identifier | mindat:1:5:9763516:5 |
| GUID | 0 | ||
| Full Reference | Puyenbroek, Robert, Bosscher, Gerard, Van De Grampel, Johan C., Rousseeuw, Bernard A. C., Van Der Drift, Emile W. J. M. (1994) The Application of Phosphazene Containing Polymers as Negative Resists in Microlithography. Phosphorus, Sulfur, and Silicon and the Related Elements, 93. 277-280 doi:10.1080/10426509408021834 | ||
| Plain Text | Puyenbroek, Robert, Bosscher, Gerard, Van De Grampel, Johan C., Rousseeuw, Bernard A. C., Van Der Drift, Emile W. J. M. (1994) The Application of Phosphazene Containing Polymers as Negative Resists in Microlithography. Phosphorus, Sulfur, and Silicon and the Related Elements, 93. 277-280 doi:10.1080/10426509408021834 | ||
| In | (n.d.) Phosphorus, Sulfur, and Silicon and the Related Elements Vol. 93. Informa UK Limited | ||
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