| Reference Type | Journal (article/letter/editorial) |
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| Title | Thermal etching of binary and ternary III–V compounds under vacuum conditions |
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| Journal | Journal of Crystal Growth |
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| Authors | Alexeev, A.N. | Author |
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| Karpov, S.Yu. | Author |
| Maiorov, M.A. | Author |
| Myachin, V.E. | Author |
| Pogorelsky, Yu.V. | Author |
| Sokolov, I.A. | Author |
| Year | 1996 (September) | Volume | 166 |
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| Issue | 1 |
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| Publisher | Elsevier BV |
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| DOI | doi:10.1016/0022-0248(96)00040-1Search in ResearchGate |
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| Generate Citation Formats |
| Mindat Ref. ID | 2829157 | Long-form Identifier | mindat:1:5:2829157:6 |
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|
| GUID | 0 |
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| Full Reference | Alexeev, A.N., Karpov, S.Yu., Maiorov, M.A., Myachin, V.E., Pogorelsky, Yu.V., Sokolov, I.A. (1996) Thermal etching of binary and ternary III–V compounds under vacuum conditions. Journal of Crystal Growth, 166 (1). 167-171 doi:10.1016/0022-0248(96)00040-1 |
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| Plain Text | Alexeev, A.N., Karpov, S.Yu., Maiorov, M.A., Myachin, V.E., Pogorelsky, Yu.V., Sokolov, I.A. (1996) Thermal etching of binary and ternary III–V compounds under vacuum conditions. Journal of Crystal Growth, 166 (1). 167-171 doi:10.1016/0022-0248(96)00040-1 |
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| In | (1996, September) Journal of Crystal Growth Vol. 166 (1) Elsevier BV |
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