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Schmidt, Christian, Kelly, Stephen T. (2018) Lab-based Nanoscale 3D X-Ray Microscopy for Failure Analysis on Advanced Semiconductors. Microscopy and Microanalysis, 24. 198-199 doi:10.1017/s1431927618013338

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Reference TypeJournal (article/letter/editorial)
TitleLab-based Nanoscale 3D X-Ray Microscopy for Failure Analysis on Advanced Semiconductors
JournalMicroscopy and Microanalysis
AuthorsSchmidt, ChristianAuthor
Kelly, Stephen T.Author
Year2018 (August)Volume24
PublisherCambridge University Press (CUP)
DOIdoi:10.1017/s1431927618013338Search in ResearchGate
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Mindat Ref. ID4884956Long-form Identifiermindat:1:5:4884956:6
GUID0
Full ReferenceSchmidt, Christian, Kelly, Stephen T. (2018) Lab-based Nanoscale 3D X-Ray Microscopy for Failure Analysis on Advanced Semiconductors. Microscopy and Microanalysis, 24. 198-199 doi:10.1017/s1431927618013338
Plain TextSchmidt, Christian, Kelly, Stephen T. (2018) Lab-based Nanoscale 3D X-Ray Microscopy for Failure Analysis on Advanced Semiconductors. Microscopy and Microanalysis, 24. 198-199 doi:10.1017/s1431927618013338
In(2018) Microscopy and Microanalysis Vol. 24. Cambridge University Press (CUP)

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